Ernisse, B.E.: search on Z-Library

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1

Complete automatic target cuer/recognition system for tactical forward-looking infrared images

Journal:

Optical Engineering

Year:

1997

Language:

english

File:

PDF, 2.92 MB

english, 1997

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Printability of extreme ultraviolet lithography mask pattern defects for 22-40 nm half-pitch features

La Fontaine, Bruno M., Kloster, Grant M., Liang, Ted, Younkin, Todd R., Putna, Ernisse S., Caudillo, Roman, Son, Il-Seok

Year:

2010

Language:

english

File:

PDF, 394 KB

english, 2010

3

The effects of mechanical stress on Ca45 transport in male rat bone in Vitro

Clive C. Solomons, David J. Ernisse, Richard A. Roberts

Journal:

Mathematical Biosciences

Year:

1970

Language:

english

File:

PDF, 604 KB

english, 1970

4

[American Institute of Aeronautics and Astronautics AIAA Guidance, Navigation, and Control Conference - Toronto, Ontario, Canada ()] AIAA Guidance, Navigation, and Control Conference - Comprehensive In-Flight Simulation Based Advanced Maneuver & Upset Recovery Training Study

Priest, James, Ernisse, Brian, McMahon, Ryan

Year:

2010

Language:

english

File:

PDF, 1.04 MB

english, 2010

5

Comparative Performance of Four Serodiagnostic Procedures for Detecting Bovine and Equine Vesicular Stomatitis Virus Antibodies

Katz, J. B., Ernisse, K. A., Landgraf, J. G., Schmitt, B. J.

Journal:

Journal of Veterinary Diagnostic Investigation

Year:

1997

Language:

english

File:

PDF, 219 KB

english, 1997

6

[IEEE 1997 IEEE Aerospace Conference - Snowmass at Aspen, CO, USA (1-8 Feb. 1997)] 1997 IEEE Aerospace Conference - An automatic target cuer/recognizer for tactical fighters

Ernisse, B.E., Rogers, S.K., DeSimio, M., Raines, R.A.

Year:

1997

Language:

english

File:

PDF, 2.65 MB

english, 1997

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Demonstration of full-field patterning of 32 nm test chips using EUVL

Vandentop, Gilroy, Schellenberg, Frank M., La Fontaine, Bruno M., Chandhok, Manish, Putna, Ernisse S., Younkin, Todd R., Clarke, James S., Carson, Steven, Myers, Alan, Leeson, Michael, Zhang, Guojing,

Year:

2009

Language:

english

File:

PDF, 2.58 MB

english, 2009

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